Key equipment

Batch Wafer Systems

Activator 150

High-temperature furnace for SiC and GaN annealing and graphene growth

Activator 150

Oxidator 150

High-temperature oxidation furnace

Oxidator 150

Verticoo 200

Vertical system for mass production

test1

E 2000

Horizontal furnace for mass production

E 2000 horizontal furnace

E 1550

Horizontal furnace for pilot production

E 1550 horizontal furnace

E 1200

Horizontal furnace for R&D

E 1200 Horizontal furnace

Single Wafer Systems

RTP System: c.RAPID150

Rapid Thermal Processing for Compound Semiconductor and Silicon

RTP System

Packaging

VLO 180 & VLO 300

Vacuum Soldering System for high volume production

VLO 300

VLO 20

Vacuum Soldering System for R&D and small volume production

VL0 20

VLO 6 & VLO 12

Vacuum Soldering System for Advanced Packaging and R&D

VLO 6