Produces high purity polysilicon based on the Siemens process
The centrotherm SiTec CVD [Chemical Vapor Deposition] Reactor is a key equipment for the production of high purity polysilicon based on the Siemens process using a mixture of trichlorosilane (TCS) and hydrogen (H2) as process gas. The CVD Reactor stands out due to its low power consumption and its high production capacity. It is suitable for both solar and microelectronic grade polysilicon production.
The CVD Reactor is provided in 18 pair and 24 pair design: whereas the 18 pair reactor has an annual production capacity of more than 175 metric tons and an energy consumption of less than 70 kWh/kg, the 24 pair reactor produces annually from 350 to 400 metric tons and has an energy consumption of less than 60 kWh/kg without heat recovery system.
The reactor unit consists of a cylindrical bell jar, a base plate and electrodes and accommodates 18 or 24 pairs of slim rods for the deposition of polysilicon. Depending on requirements, the reactor can be delivered customized regarding electrical power supply, HMI control and piping. Both versions have an integrated evaporator, whereas the 24 pair reactor is delivered with a heat recovery system additionally. This system generates sufficient steam for the operation of an entire polysilicon plant and reduces operating costs significantly.
- Fully integrated reactor package with gas, power supply and automation system
- High production capacity
- Low energy consumption
- Guaranteed performance parameters
- Potential to increase the existing capacity of the polysilicon plant
- TÜV-proven equipment
- Manufactured according to customer specified standards (AD2000, ASME, SELO)
- Commissioning, supervision and start-up by an experienced centrotherm SiTec team
Note: centrotherm photovoltaics AG reserves the right to make changes in the product specifications at any time and without notice.