PECVD system
Batch-type system for nitride deposition in c-Si solar cell processing
The centrotherm batch-type PECVD system combines high throughput and excellent process performance with a small footprint and low total cost of ownership. The unique advantages of the batch system are the high flexibility towards varying production load and process sequence as well as the continued operation in case of tube maintenance or shut-down.
A wide range of configurations is available to cover different processes, capacity requirements and automation levels.
The batch PECVD system produces highest quality anti-reflection layers for crystalline solar cells with maximum efficiency gain using direct plasma deposition. Ease of maintenance is ensured since the deposition is physically confined to the graphite boats holding the wafers. The process tubes are only marginally affected by parasitic deposition. Thus, chamber cleaning is reduced to yearly or bi-yearly tasks without notable impact on tool uptime.
- Excellent hydrogen passivation
- Integrated surface conditioning (good adhesion, no blistering)
- Variable process combinations for multiple and graded layers
- High availability due to redundancy and short cycle time
- Up to 4 independently operated stacked quartz tube reactor chambers
- Integrated automated boat handling system
- Advanced water cooling system prevents thermal interference between different tubes
- Modular design for ease of installation and start-up
Processes
Here you will find recommended system upgrades.
Note: centrotherm photovoltaics AG reserves the right to make changes in the product specifications at any time and without notice.
