Horizontal furnace system for pilot production applications
The centrotherm c.E1550 horizontal furnace is optimized to support the multiple process capability needs of a small or medium volume production and features high process performance and flexibility. It contains up to 4 stacked quartz or SiC tube process chambers for wafer sizes up to 300 mm.
c.E1550 perfectly combines operational and maintenance costs with a small footprint and thus allows the user cost-effective production possibilities.
- Atmospheric, PECVD and LPCVD processes
- Process selectable chamber options available
- Flatzone 600mm
- Advanced water cooling system guarantees no thermal interference between different process tubes
- Modular component design for ease of installation and start up in clean room facilities
- Integrated lift for automated boat handling
- Integrated boat buffering and cooling system
- Fully automated Wafer-Transfer-System with Cassette-to-Cassette Handling