Horizontal Furnace c.E2000
Horizontal Wafer Process System
Process Tube Horizontal Furnace

Wafer process system for mass production

centrotherm c.E2000, specially designed for serial production, is an exceptional solution on account of its high process performance, maximum throughput, low maintenance costs and small footprint.

The furnace offers flexible process capability and contains up to 4 stacked quartz or SiC tube process chambers for wafer sizes up to 300 mm.


  • Atmospheric, PECVD and LPCVD processes
  • Process specific configuration of individual tubes within the furnace
  • Flatzone 1050mm
  • Advanced water cooling system guarantees no thermal interference between different process tubes
  • Modular component design for ease of installation and start up in clean room facilities


  • Annealing
  • Diffusion
  • Oxidation


  • Fast-Cool-System
  • Integrated lift for automated boat handling
  • Integrated boat buffering and cooling system
  • Fully automated Wafer-Transfer-System with Cassette-to-Cassette Handling